Olympus LMPLANFL N 50X Long Working Distance Objective 40X - 50X 239 immediately deployable system for brightfield

immediately deployable system for brightfield

measurement functions

High-content cell screening and automated imaging workflows

this 50× objective helps overcome optical limitations posed by coverslips and air gaps

5mm working distance for large-area overview inspection of opaque specimens including wafers

Olympus LMPLANFL N 50X Long Working Distance Objective 40X - 50X 239 immediately deployable system for brightfieldPremium 50 semi apochromatic objective with long working distance ideal for high magnification observation requiring exceptional clearance and superior optical performance. 50 Magnification, NA 0. 50 High magnification with excellent resolution for detailed structure observation. Long Working Distance (~10. 6 mm) Exceptional clearance for thick specimens and reduced risk of sample contact. Semi Apochromatic Correction Superior color correction and